Introduction

Editorial Board

Editor-in-Chief

• Thomas Lippert, Thin Films and Interfaces Group, Paul Scherrer Institute, Villigen, Switzerland

Senior Editors

• Ulrich Aschauer, Departement für Chemie und Biochemie, University of Bern, Bern, Switzerland
• Steve S. Chung, Department of Electronics Engineering, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
• Emil List-Kratochvil, Institut für Physik, Institut für Chemie & IRIS Adlershof, Humboldt-Universität zu Berlin, Berlin, Germany
• Vassilia Zorba, Laser Technologies Group, Lawrence Berkeley National Laboratory, Berkeley, USA

Board of Editors

• Stela Canulescu, Department of Photonics Engineering, Technical University of Denmark, Kongens Lyngby, Denmark
• Zhen-Chao Dong, University of Science and Technology of China, Hefei, China
• Costas Fotakis, FORTH Institute of Electronic Structure and Laser, Irákleion, Greece; Foundation for Research and Technology Hellas, Heraklion, Greece
• Li Gao, Fundamentals of Laser Processing, Seagate (United States), Cupertino, USA
• Stanislav Gorb, Zoological Institute: Functional Morphology and Biomechanics, Kiel University, Kiel, Germany
• Michael Hirscher, Max Planck Institute for Intelligent Systems, Stuttgart, Germany
• Saulius Juodkazis, Swinburne University of Technology, Melbourne, Australia
• Krzysztof Kamil Żur, Faculty of Mechanical Engineering, Bialystok University of Technology, Bialystok, Poland
• Andrei Kanaev, Centre National de la Recherche Scientifique, Paris, France; Laboratoire des Sciences des Procédés et des Matériaux, Villetaneuse, France
• Anne Kietzig, Department of Chemical Engineering, McGill University, Montreal, Canada
• Ya-Chin King, Electrical engineering, National Tsing Hua University, Hsinchu, Taiwan
• Pei-Wen Li, Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
• Gengchiau Liang (Albert), Industry Academic Innovation School, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
• Marek Marcinek, Faculty of Chemistry Technology, Warsaw University of Technology, Warsaw, Poland
• James Michael Fitz-Gerald, Department of Materials Science and Engineering, University of Virginia, Charlottesville, USA
• Elzbieta Pach, Institut de Ciència de Materials de Barcelona, Cerdanyola del Vallès, Spain
• Alexandra Palla-Papavlu, Lasers Department, National Institute for Laser Plasma and Radiation Physics, Bucharest, Romania
• Basudev Pradhan, Department of Energy Engineering, Central University of Jharkhand, Ranchi, India
• Timon Rabczuk, Chair of Computational Mechanics, Bauhaus-Universität Weimar, Weimar, Germany
• Hamed Rajabi, London South Bank University, London, United Kingdom
• Klaus Rätzke, Technische Fakultät, Institut für Materialwissenschaft, Kiel University, Kiel, Germany
• Matthias Saba, University of Fribourg, Fribourg, Switzerland
• Wenping Si, School of Materials Science and Engineering, Hebei University of Technology, Tianjin, China
• Jaroslaw Syzdek, Bio-Logic USA LLC, Knoxville, TN, United States of America
• Son Tung Ha, Agency for Science, Technology and Research, Singapore; Institute of Materials Research and Engineering, Singapore
• Montonori Watanabe, International Inst. for Carbon-Neutral Energy Research (I2CNER), Kyushu University, Fukuoka, Japan
• Myong Yong Choi, Gyeongsang National University, Chinju, Korea (Republic of)

Aims & Scope

• Surfaces and thin films

• Condensed phase materials

• Nanostructured materials

• Nanotechnology applications

• Advanced processing and characterization techniques

• Optical and electronic materials

• Production and process engineering